| 发明名称 |
Process solutions containing surfactants |
| 摘要 |
Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of semiconductor devices.
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| 申请公布号 |
US2007010409(A1) |
申请公布日期 |
2007.01.11 |
| 申请号 |
US20060520971 |
申请日期 |
2006.09.14 |
| 申请人 |
ZHANG PENG;CURZI DANIELLE M K;KARWACKI EUGENE J JR;BARBER LESLIE C |
发明人 |
ZHANG PENG;CURZI DANIELLE M.K.;KARWACKI EUGENE J.JR.;BARBER LESLIE C. |
| 分类号 |
A61Q5/02;G03F7/004;G03F7/09;G03F7/16;G03F7/30;G03F7/32;G03F7/38;G03F7/40;G03F7/42;H01L21/027;H01L21/304 |
主分类号 |
A61Q5/02 |
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