| 摘要 |
<p>An exposure mask is provided to control easily the dose of exposure and to acquire an intended exposed pattern by determining the dose of exposure on the basis of an arbitrary portion of the exposure mask itself using a reflective portion composed of first and second regions. An exposure mask includes an incident portion and a reflective portion. The incident portion(33) is used for passing incident light without a phase shift. The reflective portion(35) is composed of a first region and a second region. The first region(36) is formed like a Z-shaped structure on the incident portion in order to apply a first phase shift to a first portion of the incident light. The second region(37) is used for applying a second phase shift to a second portion of the incident light.</p> |
