POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

摘要

A positive resist composition which comprises a resin ingredient (A) and an acid generator ingredient (B), wherein the ingredient (A) comprises a copolymer (A1) comprising a constituent unit (a1) derived from an acrylic ester containing an acid-dissociable dissolution-inhibitive group containing a monocyclic or polycyclic group, a constituent unit (a2) derived from an acrylic ester containing a lactone-containing cyclic group, a constituent unit (a3) derived from an acrylic ester containing a hydroxylated and/or cyanated polycyclic group, and a constituent unit (a4) represented by the following general formula (a4-1). [In the formula, R is hydrogen, halogeno, lower alkyl, or lower haloalkyl; R' is hydrogen, lower alkyl, or C_1-5 alkoxy; and f is 0 or 1.]