| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method and an exposure device for accurately detecting a planar shape of a reticle without causing deterioration of throughput. <P>SOLUTION: The exposure method is composed so that a pattern of the reticle is exposed on a body to be exposed via a projection optical system while synchronously scanning the reticle and the body to be exposed. The method has a step for acquiring planar-shape data showing the planar shape of the reticle, and a step for controlling the synchronous scanning on the basis of the planar-shape data. The step for acquiring the planar-shape data has a step in which a measuring position for measuring the planar-shape of the reticle is detected as an erroneous measuring position if it has an abnormal measurement result, and a step for measuring the planar shape of the reticle at a scanning speed during the exposure. The measurement results are acquired by the step for measuring the planar shape of the reticle and do not include the measurement result of the erroneous measuring position, and are used as the planar-shape data in the control step. <P>COPYRIGHT: (C)2007,JPO&INPIT |
