Wafer inspection apparatus

摘要

A wafer inspection apparatus has a supporting means ( 10 ) for rotatably supporting a wafer (W) formed of a disk, a circumferential edge imaging means ( 40 ) for imaging a circumferential edge (S) of the wafer (W) that is supported by the supporting means for rotation, a notch imaging means ( 50 ) for imaging a notch (N), a notch illumination part ( 52 ) for illuminating the notch (N), and a control means ( 70 ) for processing image data imaged by the circumferential edge imaging means ( 40 ) and the notch imaging means ( 50 ). The circumferential edge imaging means ( 40 ) has a plurality of imaging cameras ( 41 ) for imaging a plurality of different parts in a thickness direction of the circumferential edge of the wafer (W). The different parts of the circumferential edge (S) of the wafer (W) include an apex at right angles to a surface of the wafer (W) and a front side bevel and a back side bevel inclined relative to the apex. The notch imaging means ( 50 ) for the wafer (W) having the notch (N) has a plurality of imaging cameras ( 51 ) for imaging different parts in the thickness direction of the notch (N).