发明名称 |
SEMICONDUCTOR WAFER MANUFACTURING METHOD, SEMICONDUCTOR WAFER DOUBLE-SIDED GRINDING METHOD, AND SEMICONDUCTOR WAFER DOUBLE-SIDED GRINDING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To eliminate the degradation in chamfering profile and the variation in chamfering profile in the circumferential direction of a wafer while at the same time preventing cracking and chipping of the periphery of the wafer, when conducing double-sided grinding on the semiconductor wafer under such a state that the periphery is not chamfered (or the periphery is roughly chamfered). SOLUTION: The silicon wafer 1 is performed in double-sided grinding with the periphery 1R protected by a carrier 13 as a protection member. With one face 1a of the silicon wafer 1 floated from a pad 11 by supplying wafer to the face 1a, the other face 1b of the silicon wafer 1 is gripped and then the silicon wafer 1 is taken out of the carrier 13. After the double-sided grinding process (after taking out the wafer), a chamfering process is performed. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2006332281(A) |
申请公布日期 |
2006.12.07 |
申请号 |
JP20050152882 |
申请日期 |
2005.05.25 |
申请人 |
KOMATSU ELECTRONIC METALS CO LTD |
发明人 |
FUTAMURA KIMIYASU |
分类号 |
H01L21/304;B24B7/20;B28D5/04 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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