PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD

摘要

In a plasma oxidation treatment apparatus (100), double plates (60) are arranged above a susceptor (2). An upper plate (61) and a lower plate (62) are composed of a dielectric material such as quartz, separately arranged in parallel at a prescribed interval, for instance an interval of 5mm, and have a plurality of through holes (61a, 62a). The two plates are arranged one over another by shifting the positions so that the through hole (62a) of the lower plate (62) and the through hole (61a) of the upper plate (61) are not overlapped.