发明名称 |
SMART CONDITIONER RINSE STATION |
摘要 |
<p>A method and apparatus for monitoring polishing pad conditioning mechanisms is provided. In one embodiment, a semiconductor substrate polishing system includes a rinse station, a polishing surface, a conditioning element, and a conditioning mechanism. The conditioning mechanism selectively positions the conditioning element over the polishing surface and over the rinse station. At least one sensor is provided and is configured to detect a first position and a second position of the conditioning element when disposed over the rinse station.</p> |
申请公布号 |
WO2006127054(A1) |
申请公布日期 |
2006.11.30 |
申请号 |
WO2006US00736 |
申请日期 |
2006.01.10 |
申请人 |
APPLIED MATERIALS, INC.;YILMAZ, ALPAY;KARUPPIAH, LAKSHMANAN |
发明人 |
YILMAZ, ALPAY;KARUPPIAH, LAKSHMANAN |
分类号 |
H01L21/00;B24B37/04;B24B53/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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