| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment apparatus where a whole face of a substrate can efficiently be heated to a sufficiently uniform temperature. SOLUTION: The heat treatment apparatus is provided with: a chamber 10 having an opening part 13 for substrate W passage; a heating plate 21 which is arranged in the chamber 10 and in which the substrate W is placed on an upper part; and an opening/closing door 30 where the opening part 13 in the chamber 10 can be opened/closed/moved. The chamber 10 is provided with an outer layer 12 and an inner layer 11 covering a whole region of an inner peripheral face of the outer layer 12. A whole region of an inner face of the inner layer 11 is heat-reflected. The opening/closing door 30 is provided with an opening/closing door outer layer 32 and an opening/closing inner layer 31 covering a face facing an inner part of the chamber 10 in the opening/closing door outer layer 32. The face facing the inner part of the chamber 10 in the opening/closing door inner layer 31 is heat-reflected. COPYRIGHT: (C)2007,JPO&INPIT
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