PROCESS FOR PRODUCING COMPOSITION FOR POLISHING

摘要

[PROBLEMS] To provide a method for producing a composition for polishing that can realize a high polishing speed and has no significant surface defect in the polished surface. [MEANS FOR SOLVING PROBLEMS] A process for producing a composition for polishing, comprising a zirconium oxide sol, the process comprising the steps of firing a zirconium compound having a d50 value, wherein d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles, of 5 to 25 µm in terms of zirconium compound particles in the measurement of a zirconium compound slurry by laser diffractometry, and a d99 value, wherein d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles, of not more than 60 µm in terms of zirconium compound particles, in a temperature range of 400 to 1000ºC, and subjecting the zirconium oxide powder to wet pulverization in an aqueous medium until the d50 value of the zirconium oxide particles and the d99 value of the zirconium oxide particles in the measurement of the zirconium oxide slurry by laser diffractometry are brought to 80 to 150 nm and 150 to 500 nm, respectively.