发明名称 Methods for planarization of group VIII metal-containing surfaces using oxidizing agents
摘要 A planarization method includes providing a second and/or third row Group VIII metal-containing surface (preferably, a platinum-containing surface) and positioning it for contact with a polishing surface in the presence of a planarization composition that includes an oxidizing agent.
申请公布号 US2006261040(A1) 申请公布日期 2006.11.23
申请号 US20060494172 申请日期 2006.07.27
申请人 MICRON TECHNOLOGY, INC. 发明人 KLEIN RITA J.;SINHA NISHANT;SABDE GUNDU;UHLENBROCK STEFAN;WESTMORELAND DONALD L.
分类号 C09K13/00;C03C15/00;C09G1/02;C23F3/00;H01L21/321;H01L21/461 主分类号 C09K13/00
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