发明名称 |
Methods for planarization of group VIII metal-containing surfaces using oxidizing agents |
摘要 |
A planarization method includes providing a second and/or third row Group VIII metal-containing surface (preferably, a platinum-containing surface) and positioning it for contact with a polishing surface in the presence of a planarization composition that includes an oxidizing agent.
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申请公布号 |
US2006261040(A1) |
申请公布日期 |
2006.11.23 |
申请号 |
US20060494172 |
申请日期 |
2006.07.27 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
KLEIN RITA J.;SINHA NISHANT;SABDE GUNDU;UHLENBROCK STEFAN;WESTMORELAND DONALD L. |
分类号 |
C09K13/00;C03C15/00;C09G1/02;C23F3/00;H01L21/321;H01L21/461 |
主分类号 |
C09K13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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