| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material having good strippability, excellent in resolution and tenting property, excellent also in developability, and ensuring little change in resist line width, profile, etc., irrespectively of a change in development time (large development latitude), and to provide a pattern forming apparatus equipped with the pattern forming material and a pattern forming method using the pattern forming material. <P>SOLUTION: The pattern forming material has at least a photosensitive layer formed using a photosensitive resin composition containing at least a binder, a polymerizable compound and a photopolymerization initiator, wherein the polymerizable compound contains at least a compound having one or more urethane groups and one polymerizable group within a molecule. The compound having one or more urethane groups and one polymerizable group within a molecule preferably has a polyalkylene oxide chain within a molecule and preferably has one urethane group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
