发明名称 METHOD FOR FABRICATING A DUAL DAMASCENE AND POLYMER REMOVAL
摘要 A method for fabricating a dual damascene includes a partial etching process, a photoresist layer stripping process, and a blanket etching process. After the blanket etching process, an in-situ dry cleaning process is performed to remove residual polymers resulting from the etching processes.
申请公布号 US2006246717(A1) 申请公布日期 2006.11.02
申请号 US20060458105 申请日期 2006.07.18
申请人 WANG JENG-HO 发明人 WANG JENG-HO
分类号 H01L21/465 主分类号 H01L21/465
代理机构 代理人
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