| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a seal member or barrier member with which turbulent flow is reduced and overflowing of immersion liquid is reduced in a liquid supply system for a liquid-immersion lithographic apparatus. <P>SOLUTION: A liquid supply system for the liquid-immersion lithographic apparatus provides a laminar flow of immersion liquid between the final element of a projection system and a substrate. A control system minimizes the chances of overflowing, and an extractor includes an array of outlets configured to minimize vibrations. <P>COPYRIGHT: (C)2007,JPO&INPIT |
