PARTICLE INSPECTION APPARATUS AND METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

An apparatus and a method for examining an extraneous substance and a method for manufacturing an exposure apparatus and a device are provided to manufacture a high integrated semiconductor device with low cost and to realize minute extraneous substance examination by employing a relative position controlling machine. A light irradiating unit irradiates a test light on an object surface. A first detecting unit(3) detects a dispersed light on the object surface. A shading unit(5) restricts an irradiation range of the test light irradiated by the light irradiating unit within a limited region of the object surface. A position measuring machine(24) measures a position of the object surface. A relative position controlling machine(23) controls a relative position between the shading unit and the object surface based on measured position information of the object surface.