| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition making small a fluctuation of exposure latitude with time from exposure to post-heating and making small a sensitivity fluctuation between liquid immersion exposure and normal exposure, and to provide a pattern-forming method using the composition. <P>SOLUTION: The positive resist composition is to be used in a manufacturing process of a semiconductor such as an IC, manufacture of a circuit board for a liquid crystal, a thermal head or the like, or a lithographic process of other photo-application, and the pattern-forming method is carried out by using the composition. The composition comprises a resin having a structure showing a basicity and capable of increasing the solubility in an alkali developing solution by the action of an acid. <P>COPYRIGHT: (C)2007,JPO&INPIT |
