| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and an exposure method that are suitably adaptive to changes of a photosensitive material (resist material etc.). <P>SOLUTION: The exposure device which performs exposure by the exposure means of reading a reference alignment mark for an exposure position provided on a substrate, positioning the photosensitive material that the substrate has for exposure based upon acquired data on the reference position, and projecting a light beam modulated corresponding to image data on the surface of the photosensitive material while relatively moving the substrate in a designated scanning direction, has an exposure condition adjusting means and a kind specifying means for the photosensitive material which previously hold a plurality of pieces of exposure device control information depending upon photosensitive materials together by kinds of the photosensitive materials and adjust condition settings of the exposure means according to the exposure device control information, and switches the exposure device control information according to the kinds of photosensitive materials. <P>COPYRIGHT: (C)2007,JPO&INPIT |
