发明名称 Semiconductor substrate with occurrence of slip suppressed and method of manufacturing the same
摘要 A semiconductor substrate includes a denuded zone that is formed on a surface where a semiconductor device is to be formed, and an oxygen precipitate layer that is formed on at least a part of a surface, which is opposite to the surface where the semiconductor device is to be formed.
申请公布号 US2006226557(A1) 申请公布日期 2006.10.12
申请号 US20050154645 申请日期 2005.06.17
申请人 YAMAMOTO AKIHITO 发明人 YAMAMOTO AKIHITO
分类号 H01L23/29;H01L21/00 主分类号 H01L23/29
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