| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of precisely controlling the positions of a mask stage and a substrate stage. <P>SOLUTION: In the aligner EX, the pattern of a mask M is exposed to light on a photosensitive substrate P by using a projection optical system having a first projection optical unit arranged at the forward side in a scanning direction, and a second one arranged at the backward side in the scanning direction. The aligner EX comprises a first substrate focus system 50 that is arranged at the forward side in the scanning direction as compared with the exposure region formed by the first projection optical unit, and detects a position in the direction of the optical axis of the first projection optical unit of a photosensitive substrate; and a second substrate focus system 52 that is arranged at the backward side in the scanning direction as compared with an exposure region formed by the second projection optical unit, and detects a position in the direction of the optical axis of the second projection optical unit of the photosensitive substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
