| 摘要 |
PROBLEM TO BE SOLVED: To provide a rotation processing apparatus for a rectangular substrate with much more excellent inplane uniformity by decreasing re-attachment of chemical or washing, which is supplied to the rectangular substrate again to the rectangular substrate. SOLUTION: Support arms 13 are extended along diagonal lines of a rectangular substrate 10. A connection ring 14 is provided to reinforce the support arms 13 and has an outer circumference 141 equal to or smaller than an inscribed circle of the rectangular substrate 10. Substrate support pins 15 are provided to end regions 131 of the support arms 13. Each of the substrate support pins 15 is arranged to both sides apart by each apex angle of the rectangular substrate 10 and in contact with an edge on a rear side of an end face of the rectangular substrate 10 to support the rectangular substrate 10 nearly in a horizontal direction, and in contact with part of the end face of the rectangular substrate 10 to attain support during the turning of the rectangular substrate 10. COPYRIGHT: (C)2006,JPO&NCIPI
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