发明名称 |
FLASH MEMORY DEVICE HAVING BAR RESISTANCE MEASURING PATTERN AND METHOD FOR FORMING THE SAME |
摘要 |
<p>A flash memory device having a bar resistance measuring pattern and a method for forming the same are provided to reduce the variation of bar resistance measuring value by directly connecting a contact to a floating gate for measuring the bar resistance. An isolation layer(23) is formed in a substrate(20) to define an active region. A floating gate(26) for measuring bar resistance is filled in the surface of the isolation layer. A control gate pattern(33) is formed on a desired portion of the floating gate. A dielectric film(27) is formed between the floating gate and the control gate pattern. Bar resistance measuring patterns(30) are connected to the floating gate and isolated with the control gate pattern.</p> |
申请公布号 |
KR100632645(B1) |
申请公布日期 |
2006.09.28 |
申请号 |
KR20050071034 |
申请日期 |
2005.08.03 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
YANG, KI HONG;PARK, SANG WOOK |
分类号 |
H01L27/115 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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