发明名称 FLASH MEMORY DEVICE HAVING BAR RESISTANCE MEASURING PATTERN AND METHOD FOR FORMING THE SAME
摘要 <p>A flash memory device having a bar resistance measuring pattern and a method for forming the same are provided to reduce the variation of bar resistance measuring value by directly connecting a contact to a floating gate for measuring the bar resistance. An isolation layer(23) is formed in a substrate(20) to define an active region. A floating gate(26) for measuring bar resistance is filled in the surface of the isolation layer. A control gate pattern(33) is formed on a desired portion of the floating gate. A dielectric film(27) is formed between the floating gate and the control gate pattern. Bar resistance measuring patterns(30) are connected to the floating gate and isolated with the control gate pattern.</p>
申请公布号 KR100632645(B1) 申请公布日期 2006.09.28
申请号 KR20050071034 申请日期 2005.08.03
申请人 HYNIX SEMICONDUCTOR INC. 发明人 YANG, KI HONG;PARK, SANG WOOK
分类号 H01L27/115 主分类号 H01L27/115
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