| 摘要 |
A positive resist composition comprising: (A) a resin insoluble or sparingly soluble in an alkali but capable of decomposing under an action of an acid to increase a solubility in an alkali developer, the resin having a beta-(meth)acroyloxy-gamma-butyrolactone repeating unit represented by the following formula (1) containing a lactone ring which may have a substituent; and (B) a compound capable of generating an organic acid represented by the formula (2), (3), (3'), (4) or (5) as defined herein upon irradiation of actinic rays or radiation.
|
