| 摘要 |
<p>An exposure apparatus (10) includes a light source unit (60) for emitting exposure light, a DMD (90) for performing spatial light modulation, based on an image signal, on the exposure light, an imaging optical system (50) for forming an image on a photosensitive material (12) with the exposure light on which spatial light modulation has been performed, and a pair (54) of wedge prisms for adjusting focus by changing the optical path length of the modulated exposure light when an image is formed on the photosensitive material (12) with the modulated exposure light. In the imaging optical system (50), distortion at a peripheral portion of a projection lens is increased, and optical performance of the lens at a region including a central portion is improved. An image is formed only by a substantially rectangular region of the projection lens, including the central portion, with the modulated exposure light.</p> |
