SUBSTRATE PROCESSING DEVICE, SUBSTRATE PROCESSING METHOD, AND SUBSTRATE PROCESSING PROGRAM

摘要

PROBLEM TO BE SOLVED: To shorten remarkably a tact time for processing operation of supplying processing liquid to a substrate to be processed or applying the same on the substrate to be processed through spinless system. SOLUTION: A zone wherein a first substrate transfer unit 84A and a second substrate transfer unit 84B retain and transfer the substrate G together is not a total transfer zone from a carry-in position to a carry-out position but an intermediate zone from the starting position of application to the finishing position of application. The first substrate transfer unit 84A finishes the role of transfer for the substrate G at a time when the substrate Giis transferred to the finishing position of application, and immediately returns to the carry-in position to start the transfer of a succeeding new substrate Gi+1. On the other hand, the second substrate transfer unit 84B transfers individually the substrate Gifrom the finishing position of application to the carry-out position, subsequently, returns to the starting position of application before the carry-in position, and waits for the first substrate transfer unit 84A which transfers individually the next substrate Gi+1to that position. COPYRIGHT: (C)2006,JPO&NCIPI