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发明名称
Teilsilicidierungsverfahren zur Bildung von flachen Source/Drain-Übergängen
摘要
申请公布号
DE69929100(T2)
申请公布日期
2006.08.24
申请号
DE19996029100T
申请日期
1999.01.22
申请人
SHARP K.K.;SHARP MICROELETRONICS TECHNOLOGY, INC.
发明人
MAA, JER-SHEN;HSU, SHENG TENG;PENG, CHIEN-HSIUNG
分类号
H01L21/28;H01L21/60;H01L21/265;H01L21/285;H01L21/336;H01L29/08;H01L29/78
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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