COMPOSITION FOR FORMING SILICA-BASED FILM, METHOD FOR FORMING SILICA-BASED FILM, SILICA-BASED FILM AND ELECTRONIC PART

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a silica-based film having excellent surface smoothness as compared with conventional ones. SOLUTION: The composition for forming a silica-based film comprises (a) a siloxane resin, (b) a solvent capable of dissolving the ingredient (a) and (c) an onium salt, wherein the ratio of the above ingredient (c) to be incorporated is 0.001 to 0.5 pt.wt. relative to 100 pts.wt. of the total amount of the above ingredient (a). COPYRIGHT: (C)2006,JPO&NCIPI