| 摘要 |
In a plasma processing apparatus capable of generating a plasma in a processing chamber accommodating therein a substrate to plasma-process the substrate, a component disposed in the processing chamber includes an identification indicia formed with one or more symbols indicated by arranging a plurality of dotted recesses on a surface of the component. The dotted recesses are of a substantially circular shape in a plane view and a substantial U-shape in a sectional view. The life span of the component can be detected based on a status of the identification indicia.
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