| 发明名称 |
A METHOD AND SYSTEM FOR CONTROLLING THE CHEMICAL MECHANICAL POLISHING BY USING A SENSOR SIGNAL OF A PAD CONDITIONER |
| 摘要 |
In a system and a method, according to the present invention, a sensor signal, such as a motor current signal, from a drive assembly of a pad conditioning system is used to control a CMP system to compensate for a change in the conditions of consumables, thereby enhancing process stability.
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| 申请公布号 |
KR20060088894(A) |
申请公布日期 |
2006.08.07 |
| 申请号 |
KR20067006277 |
申请日期 |
2004.09.17 |
| 申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
MARXSEN GERD;KRAMER JENS;STOECKGEN UWE GUNTER |
| 分类号 |
B24B7/00;B24B7/04;B24B37/04;B24B53/00 |
主分类号 |
B24B7/00 |
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