发明名称 Pattern forming method, droplet discharge head, pattern forming device, method for manufacturing color filter substrate, color filter substrate, method for manufacturing electro-optical device, and electro-optical device
摘要 A pattern forming method is for forming a pattern on a substrate that has a pattern forming region on its one surface. The pattern forming method includes scanning in a first direction the substrate provided with the pattern forming region; and discharging droplets containing pattern forming material into the pattern forming region from a droplet discharge head that is provided with a droplet discharge nozzle. The droplet discharge head is relatively oscillated relative to the one surface of the substrate by oscillating one of the droplet discharge head and the one surface relative to the other of the droplet discharge head and the one surface of the substrate in a direction different from the first direction, such that the droplets are discharged from the droplet discharge nozzle when the droplet discharge head faces the pattern forming region.
申请公布号 US2006165897(A1) 申请公布日期 2006.07.27
申请号 US20060329139 申请日期 2006.01.11
申请人 SEIKO EPSON CORPORATION 发明人 ITO TATSUYA
分类号 B05D5/00;B05C5/00;B05C11/00;B05D1/36 主分类号 B05D5/00
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