发明名称 Präzisionsbeschichtungsmaske und Verfahren zur Herstellung der Maske, Elektrolumineszenzanzeige und Verfahren zur Herstellung der Anzeige und Elektronisches Gerät
摘要 The present invention aims to provide a precision deposition mask that is easily aligned with a glass substrate in evaporating an emitting layer and the like of an organic EL display, and is strong enough to form an accurate evaporated pattern. The invention also aims to provide a method for easily and accurately manufacturing such a precision deposition mask, an organic EL display and a method for manufacturing the same, and electronic equipment including an organic EL display. <??>A precision deposition mask according to the invention includes a first brace (3) that is placed in parallel each other at given intervals. The first brace (3) forms portions that define a plurality of first openings (2). The precision deposition mask also includes at least one second brace (5) that is placed on the first brace (3) so as to intersect with the first brace (3). The second brace (5) forms portions that define a plurality of second openings (4). The second brace (5) is joined to the first brace (3) at a point where the second brace (5) intersects with the first brace (3). <IMAGE>
申请公布号 DE602004001054(D1) 申请公布日期 2006.07.20
申请号 DE20046001054T 申请日期 2004.01.08
申请人 SEIKO EPSON CORP. 发明人 YOTSUYA, SHINICHI;KUWAHARA, TAKAYUKI
分类号 H05B33/08;H05B33/10;C23C14/04;C23C14/12;C23C14/24;C23C16/04;H01L27/15;H01L51/50 主分类号 H05B33/08
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