EVAPORATION SOURCE AND VAPOR DEPOSITION APPARATUS

摘要

An evaporation source that enables controlling of the temperature of evaporation material with high accuracy and also enables conducting of cooling and heating within a short period of time; and a relevant vapor deposition apparatus. There is provided an evaporation source comprising slender vessel (102) for accommodating of an evaporation material or sublimation material and halogen heater (120a-120d) capable of directly heating the evaporation material (4) or sublimation material accommodated in the vessel to thereby attain evaporation or sublimation. The vessel (102) is made of, for example, quartz. With respect to the rolling density of filament of the halogen heater, coarse and dense portions are provided in the same halogen heater so that the thickness of film formed by vapor deposition becomes substantially constant. Thus, the evaporation material accommodated in the vessel can be uniformly heated, so that the vapor of the evaporation material can be uniformly discharged outside the vessel. Therefore, a vapor deposition film with substantially constant thickness can be formed on a substrate.