| 摘要 |
PROBLEM TO BE SOLVED: To provide a completely new working method with hydroxy groups in ultrapure water where, based on the recognition that, at the time when the concentration of OH<SP>-</SP>in ultrapure water is increased, by utilizing the OH<SP>-</SP>, working can be sufficiently performed, clean working can be performed using OH<SP>-</SP>in ultrapure water without leaving impurities in the working face of a work. SOLUTION: Using only ultrapure water excepting a trace amount of inevitable impurities, electric current is made to flow between a pair or more electrodes arranged at intervals in ultrapure water. Thus, the ultrapure water is electrolyzed, so as to increase an ion product, and a work dipped into the ultrapure water in which the concentration of hydroxy groups or the ions of hydroxy groups is increased is subjected to removal working or oxide film formation working by chemical elution reaction or oxidation reaction with the hydroxy groups or the ions of the hydroxy groups. The work is Si, and an oxide film is formed on the surface thereof. Alternatively, the work is Cu, and the Cu is subjected to removal working. COPYRIGHT: (C)2006,JPO&NCIPI
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