| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a diaphragm device which is simple in configuration and capable of making adjustments of its numerical aperture to position in the direction of an optical axis, an optical system improved in resolution without increasing the scale, an exposure device which can be improved in exposure accuracy, and to provide a device manufacturing method capable of manufacturing a device of high integration, with a high yield. <P>SOLUTION: A movable frame 32 is rotated by the driving force of a motor 37 about the optical axis of the projection optical system as a center, and is provided inside the fixing frame 31 which fixes the motor 37. The exposure device is provided inside the movable frame 32 with an arrow wheel 33 equipped with the stop vanes, and a base plate 34 which supports the arrow wheel 33 and moves it in the direction of the optical axis of the projection optical system. Further to the movable frame 32, the device has a rotation angle control groove 48, engaged with a rotation transmitting bearing 65 located on the side of the arrow wheel 33 to control the rotation angle of the arrow wheel 33 so as to adjust the opening diameter, and a slant groove 49, engaged with a slant bearing on the side of the base plate 34 so as to make the base plate 34 move in the direction of the optical axis. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
