| 摘要 |
<p>An oxime ester compound characterized by being represented by the following general formula (I). It is useful as a photopolymerization initiator. The oxime ester compound has high sensitivity and a high heat decomposition temperature. It does not impair the adhesion and alkali resistance of a photosensitive composition. The decomposition products generated from the compound by light irradiation do not adhere to a mask. (I) (In the formula, X represents alkyl, etc., provided that when m is 2 or larger, then the X's may be different; R<SUB>1</SUB>, R<SUB>2</SUB>, and R<SUB>3</SUB> each represents, e.g., an alkyl or another group, which may be substituted by a halogen atom, etc. and in which the alkylene moiety may be separated by an unsaturated bond, ether bond, etc.; A represents cycloalkylalkyl; and m is 1-4.)</p> |
