| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid-soaking exposure apparatus for preventing the generation of bubbles of liquid and the splashing of liquid generated when a sensor for controlling exposure light on the same surface plate thereof or a projected structure covering the sensor is formed, and for suppressing the deterioration of focusing performance. <P>SOLUTION: In the structure of the liquid-soaking exposure apparatus, the height of the same surface plate 1 and the exposure light sensor receiving surface are set to a height which is equal to the height of at least a wafer or the same surface plate, and the cross-sectional shape of the projected structure 2 includes inclination when a projected structure 2 exists on the same surface plate 1 by providing a cover to the sensor. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
