发明名称 Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths
摘要 A method for forming a plurality of parallel metal lines on a substrate of thin film elastomeric material and a wire grid polarizer formed by such method. A sacrificial layer is formed by coating the substrate with a water soluble polymer while the substrate is stretched. The existing tensile force is removed, leaving an undulating topology of buckled sacrificial layer material. A masking layer is then deposited at an oblique angle and then fractured into parallel lines of material by application of a second tensile force. Unmasked portions of the sacrificial layer are removed by dry etch. A metallic layer is then deposited and a lift off process employed to remove remaining portions of the sacrificial layer and materials deposited thereover. Upon removal of the second tensile force, the substrate returns to its unstressed length with metal lines of predetermined periodicity thereon.
申请公布号 US2006113279(A1) 申请公布日期 2006.06.01
申请号 US20040001449 申请日期 2004.11.30
申请人 LITTLE MICHAEL J 发明人 LITTLE MICHAEL J.
分类号 C23F1/00;B44C1/22 主分类号 C23F1/00
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