发明名称 Projection optical system, exposure apparatus, and device manufacturing method
摘要 A projection optical system projects an image of a first object onto a second object. A first imaging optical system forms a first intermediate image of the first object, and is a refractive optical system. A second imaging optical system forms a second intermediate image of the first object, and includes two mirrors, one of the two being concave. A third imaging optical system forms an image of the first object onto the second object, and includes a lens. The first, second and third imaging optical systems are arranged along an optical path from the first object in this order. The system satisfies the expression 0.80<|beta 1.beta2 <2.0 where beta 1 and beta 2 are paraxial magnifications of the first and second imaging optical systems, respectively. The first imaging optical system and the concave mirror have a common straight optical axis.
申请公布号 US7053986(B2) 申请公布日期 2006.05.30
申请号 US20050267858 申请日期 2005.11.03
申请人 CANON KABUSHIKI KAISHA 发明人 KATO TAKASHI;TERASAWA CHIAKI
分类号 G03B27/54;G02B13/14;G02B17/08;G03B27/42;G03F7/20 主分类号 G03B27/54
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