| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a conveying member with a cleaning function, which enables a uniformization of a film thickness in a cleaning layer at a high accuracy to improve a dust collecting capability. SOLUTION: The manufacturing method of the conveying member with the cleaning function comprises the steps of moving horizontally a nozzle for coating 4 while a conveying member (silicon wafer) 1 mounted on a rotating table 31 is rotated, and applying varnish 20 for forming the cleaning layer, discharged from the nozzle for coating 4 on the conveying member 1 along a substantially circular path. Then, an equalizing portion 42 equalizing a varnish-applying surface extending in a direction crossing in a water level against a rotating direction (a) is provided on a side opposed to the rotating direction (a) of the rotating table 31 at a tip of the nozzle for coating 4. COPYRIGHT: (C)2006,JPO&NCIPI
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