| 摘要 |
PROBLEM TO BE SOLVED: To provide a novel nano-structure making control method using an electron beam-inductive vapor deposition method, capable of expanding an application range, by enhancing a degree of freedom of making a nano-structure, including controlling of the incident axis direction of an electron beam without inclining the nano-structure in the middle when making the nano-structure by using the electron beam-inductive vapor deposition method. SOLUTION: This nano-structure making control method uses the electron beam-inductive vapor deposition method of this invention; and is a method for making the nano-structure by the electron beam-inductive vapor deposition method for irradiating the electron beam toward a desired position on a material, while making gas including an element being a raw material flow onto the material; and is characterized by controlling the incident axis direction of the electron beam, by controlling a focal position of the electron beam in the height direction to an irradiation surface of the electron beam. COPYRIGHT: (C)2006,JPO&NCIPI
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