发明名称 |
Method to reduce silanol and improve barrier properties in low k dielectric ic interconnects |
摘要 |
A trench and via structure is formed in a low k dielectric layer ( 100 ) formed over a silicon substrate ( 10 ). Super critical CO<SUB>2 </SUB>and a first silylization agent are used to form a chemically bonded high density surface layer ( 160 ). Silanol species are removed from the low k dielectric layer ( 100 ) using super critical CO<SUB>2 </SUB>and a second silylization agent. A barrier layer ( 190 ) and copper ( 200 ) are used to fill the trench and via structure.
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申请公布号 |
US7037823(B2) |
申请公布日期 |
2006.05.02 |
申请号 |
US20040901708 |
申请日期 |
2004.07.27 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
MATZ PHILLIP D.;AJMERA SAMEER;JIN CHANGMING;HURD TRACE Q. |
分类号 |
H01L21/4763;H01L21/306;H01L21/3105;H01L21/311;H01L21/44;H01L21/768 |
主分类号 |
H01L21/4763 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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