SYSTEM AND METHOD FOR ANALYZING PHOTOMASK GEOMETRIES

摘要

After simulated geometry (106) has been generated, simulated geometry (106) may be modified to generate a predicted resulting geometry (108). Predicted resulting geometry (108) includes a predication of the geometry that would be formed in patterned layer (58) of photomask (52) if photomask (52) were processed using modified geometry (102) as input for imaging