| 发明名称 |
EXPOSURE APPARATUS MAINTENANCE METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD AND LIQUID RECOVERING MEMBER FOR IMMERSION EXPOSURE APPARATUS MAINTENANCE |
| 摘要 |
An exposure apparatus maintenance method by which a liquid is prevented from remaining. A liquid recovering member (60) which can absorb a liquid (LQ) is mounted on a board holder (PH) and the remaining liquid (LQ) is recovered. |
| 申请公布号 |
WO2006041091(A1) |
申请公布日期 |
2006.04.20 |
| 申请号 |
WO2005JP18789 |
申请日期 |
2005.10.12 |
| 申请人 |
NIKON CORPORATION;NAGASAKA, HIROYUKI;YODA, YASUSHI |
发明人 |
NAGASAKA, HIROYUKI;YODA, YASUSHI |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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