| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide exposure equipment and an exposure method by which a foaming resist is easily and securely recovered. <P>SOLUTION: The exposure equipment includes: an exposure head 7 which irradiates light to peripheral portions of a wafer 6 provided with a processing film; and exposes the processing film, and an exhaust means 12 at a down side of the wafer 6, which includes two exhaust outlets 11 into which the foaming resist produced by exposure is absorbed, wherein one exhaust outlet 11a is arranged outside the wafer 6, while the other exhaust outlet 11b is arranged inside the wafer 6, and the foaming resist in an unsettled flying state is efficiently exhausted by the two exhaust outlets 11. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
