POLISHING PAD FOR ELECTROCHEMICAL-MECHANICAL POLISHING

摘要

The invention provides a polishing pad comprising a body having a top surface (10) comprising a first set of grooves (12) with a first depth and first width and a bottom surface comprising a second set of grooves (16) with a second depth and second width, wherein the first set of grooves (12) and second set of grooves (16) are interconnected and are oriented such that they are not aligned.