| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize highly accurate levelling measurement in the following exposure area adjacent to an immersion lithography area by one shot. <P>SOLUTION: In immersion lithography, an image projecting from a reticle is transferred onto a photosensitive surface 20A while a liquid 40 is held between a projection optics and the photosensitive surface 20A on a substrate 20. When the immersion lithography is repeated while changing an exposure area sequentially within the photosensitive surface 20A, a liquid holding frame 30 is provided to hold a liquid 40 for a part of a substrate facing surface 5A of a projection optics 5B. Thus, one exposure area EAx is included in a portion being in contact with the liquid 40 of the photosensitive surface 20A, and at least a part of a following exposure area EAx+1 adjacent to the exposure area becomes in non-contact with the liquid 40. Therefore, pre-read levelling in air is made possible. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
