| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electron beam device in which differential exhaust is possible even by an electrostatic lens in which vacuum condition is severer than a magnetic lens, differential exhaust is possible under a system which easily starts discharge such as a decelerating field objective lens, combination of an electron gun using LaB6 cathode and differential exhaust is possible, and the electron gun is operated under the space charge limiting condition with a low shot noise, and a device manufacturing method for manufacturing a semiconductor device using the electron beam device. <P>SOLUTION: The electron beam device comprises an electron optical system having an electron gun 2 and an objective lens 7 consisting of an electrostatic lens that irradiates primary electron beams emitted from the electron gun on an inspection object, and an exhaust head 12 of a differential exhaust system arranged outside of the objective lens. The spacing between the electrode of the objective lens 7 located at the nearest the inspection object W and the inspection object is same as or smaller than the distance d1-d3 between the member of the exhaust head limiting exhaust conductance of the differential exhaust system and the inspection object W. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
