| 摘要 |
<p>A system and a related method for purging high purity interfaces from low vapor pressure chemicals comprising, in one embodiment, a first manifold having a first end detachably connected to a high purity chemical container; a second end detachably connected to a process tool, or to a source of gas or of vacuum, with a first diaphragm valve regulating flow communication; and a third end detachably connected to a source of vent or of vacuum, with a second diaphragm valve regulating flow communication. A second adapter manifold also has a first end detachably connected to the container; a second end detachably connected to a source of push gas, of purge gas or of vacuum, with a third diaphragm valve regulating flow communication; and a third end detachably connected to a source of vent, with a fourth diaphragm valve regulating flow communication.</p> |
