发明名称 CLEANING UNIT AND CLEANING METHOD FOR LIQUID APPLICATOR
摘要 PROBLEM TO BE SOLVED: To provide a cleaning unit which perform cleaning while preventing dust etc. adhering to a surface of a nozzle plate from being sucked into a nozzle, in the state of noncontact of solid matter with the surface of the nozzle plate. SOLUTION: This cleaning unit 2 is equipped with a wiping liquid tank 13 for retaining a predetermined quantity of wiping liquid for cleaning the surface 10 of the nozzle plate of the nozzle unit 1, a wiping liquid channel 15 for supplying the wiping liquid 19 into the tank 13, and a moving means for moving the tank 13 relatively to the nozzle unit 1. The wiping liquid 19 is supplied to the tank 13, and the cleaning unit 2 is moved toward the surface 10 of the nozzle plate, so that the wiping liquid 19 can abut on the surface 10 of the nozzle plate. Subsequently, the wiping liquid 19 is sucked in, and the dust adhering to the surface 10 of the nozzle plate can be removed by the surface tension of the wiping liquid 19. After that, the cleaning unit 2 is made to recede. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006043963(A) 申请公布日期 2006.02.16
申请号 JP20040225859 申请日期 2004.08.02
申请人 SHARP CORP 发明人 HIGUCHI KAORU;ISONO HITOSHI;OGAKI HISASHI
分类号 B41J2/165 主分类号 B41J2/165
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