| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processor for miniaturizing and simplifying the processor as well as preventing a processing gas or the like from being leaked to the outside of the processor. <P>SOLUTION: A flow path 11 continuing from an inlet/outlet 15a to an inlet/outlet 15b is formed in a chamber 3 composing a plasma processor 1. A supply port 17 is formed so as to face the flow path 11 in the chamber 3. An exhaust port 23a facing the flow path 11 is formed in the chamber 3 between the supply port 17 and the inlet/outlet 15a. An exhaust port 23b facing the flow path 11 is formed in the chamber 3 between the supply port 17 and the inlet/outlet 15b. A conductance of the flow path 11 between the exhaust port 23a and the inlet/outlet 15a is larger than that of the flow path 11 between the exhaust port 23a and the supply port 17. A conductance of the flow path 11 between the exhaust port 23b and the inlet/outlet 15b is larger than that of the flow path 11 between the exhaust port 23b and the supply port 17. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
