发明名称 METHOD FOR FORMING ANTIREFLECTION FILM, APPARATUS FOR FORMING ANTIREFLECTION FILM, ANTIREFLECTION FILM AND OPTICAL COMPONENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming antireflection film and an apparatus for forming antireflection film capable of easily forming an antireflection film even for a substrate having a curved surface, to provide an antireflection film formed by using the method and the apparatus, and to provide an optical component having the antireflection film. <P>SOLUTION: In the method for forming antireflection film, the antireflection film having fine ruggedness of a predetermined pattern on the surface thereof is formed on the curved surface of the substrate having the curved surface by using a molding die. Therein, the molding die consists of silicone resin and the fine ruggedness corresponding to a surface shape of the antireflection film to be formed is formed. The method for forming antireflection film comprises a process of supplying resin onto the curved surface, a process of pressing a molding die to the resin supplied onto the curved surface, a process of curing the resin and obtaining cured material and a process of stripping the molding die from the cured material. Therein, both of a pitch of the ruggedness and a difference of height are less than wavelength of visible light. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006039450(A) 申请公布日期 2006.02.09
申请号 JP20040222992 申请日期 2004.07.30
申请人 SEIKO EPSON CORP 发明人 MIYAO NOBUYUKI
分类号 G02B1/11;B29C39/02;B29C39/26;B29L11/00 主分类号 G02B1/11
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